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MV-IS Image Sensor Characterization System
MV-IS Image Sensor Characterization System

Product Name : Image Sensor Characterization System

Item No. : MV-IS

Description

MV-IS is a high-performance measurement system of CCD/CMOS image sensor and camera systems for a variety of applications. The measurement wavelength can be extendable to 300 nm~1100 nm. Enlitech’s patent uniform light system provides a greater intensity than a traditional integrating sphere. Besides, the unique design for monochromator light, which enables the wavelength resolution to be up to 0.1nm and make the mesurement more accurate.
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Representative Customers:
Note: We only provide partial customer lists due to the non-disclosure agreements.

Features:
  • Exclusive uniform light system and high monochromatic light intensity
  • Full array pixel measurement
  • Divergence angle < 5°
  • Multiple camera interface
  • Is capable of hardware expansion and system upgrade
  • Laser positioning
Integration Soultions:
The system provides the solutions for the photon transfer method measurement:
  • Quantum Efficiency/Spectral Response
  • Sensibility
  • Dynamic Range
  • Dark Current /noise
  • Linearity Error LE
  • Dark current non-uniformity
  • Photo response non-uniformity
  • Chief Ray Angle, CRA
Application:
  • CCD camera
  • CMOS camera
  • UV sensor
  • Infrared light sensor
  • Camera
  • Other optoelectronic devices
Figure 1. MV-IS system can provide the monochromatic light beam with high uniformity and light intensity, and also a high signal-to-noise ratio, which makes the measurement more accurate.
(a) The divergence angle of patent uniform light system


(b) The divergence angle of Traditional integrating sphere (c) light spot (d)The system can provide monochromatic light over a continuous range of wavelengths.
Figure 2. The measurement results for the industrial camera @ 470 nm wavelength.
Measurement parameters
Quantum Efficiency 61.84 %
System Gain 0.04584 DN/e-
Dark Noise 0.230 DN
Dark current non-uniformity 0.256 DN
Photo response non-uniformity 4.09 %
Max Signal-to-noise ratio 35.11 dB
non-linear error 0.093 %
The minimum number of photons 8.93 photons
Saturation irradiation 5363.49 photons
Dynamic Range 55.57 dB
Dark Current 3.57 DN/s
Figure 3. The measurement results of Quantum Efficiency for the industrial camera at 300 nm - 1100 nm
Figure 4. The comparison of irradiance between Enlitech’s exclusive uniform light system and a traditional integrating sphere.
Figure 5. The comparison of Photon Flux between Enlitech’s patent uniform light system and a traditional integrating sphere.
Figure 6. Enlitech’s patent uniform light at diferent monochromatic light wavelengths, the uniformity can be up to 99%
630 nm Uniformity 99.05%
430 nm Uniformity 99.04%
530 nm Uniformity 99.06%
Specification(Customized):
Monochromatic
Light Source
  • Instability <1%
  • Cooling system
  • Ozone Removal system
  • 300nm~1100nm (Extensible)
  • Grating monochromatic light
  • Continuously adjustable irradiation power : 0~100%
  • Resolution: 0.1 nm
  • Wavelength Accuracy:±1nm
  • Wavelength Repeatability:±0.5nm
Uniformity
System-A
  • MV-IS Optical system, spot size 30 mm×30 mm,designed in accordance with the chip size of CCD and CMOS.
  • Spot uniformity ≥99%
  • Position of uniform light: a distance of 150 mm from the exit of the uniformity system
  • Intensity of uniform light:>5 μw/cm2
  • Continuously adjustable irradiation power
  • Pixel QE Measurement:Yes(sufficient light intensity)
  • Beam-divergence angle: <5°(customized)
Uniformity System-B
  • 4”Integrating sphere, uniformity 99 %
Detector
  • BNC interface
  • Wavelength Range 190 nm ~ 1100 nm
  • NIM traceable Certificate
  • Area: 10×10cm2,Nonunifornity 0.5%
  • Min. resolution of picoammeter: 10 fA
Control System
  • the latest Industrial computer, LCD, 4GB RAM, DVD, Windows7 system
Measurement Dark Room
  • Black coating which can keep out the stray lights.
Image Capture Interface
  • USB, IEEE, 1394 and BNC.
Sample Stage
  • 3-axis adjustment stage, Sample holder, Laser positioning function
Software and development tool
  • Integrated system-control sofware
  • Development tool
    • Monochromator control
    • Filter wheel control
    • Picoammeter control
    • Automatic stage control (Optional)
  • Customizable measurement software (Optional)